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2026 Shenzhen International photoresist industry technology exhibition
Industry: Other Industry
Time: 2026/06/10 - 06/12 (Wed To Fri Total 3 Days)    Error Correction
Address: Guangdong Shenzhen International Convention and Exhibition Center (New Building) ChinaGuangdong ProvinceShenzhenBao'an District No.1 Zhancheng Road, Fuhai Street, Bao'an District, Shenzhen
Sponsor:2026 Shenzhen International photoresist industry technology exhibition - Organizing Committee
Organizer:2026 Shenzhen International photoresist industry technology exhibition - Organizing Committee
233Days To Go
  • Telephone:13162771109
  • Contact:Mr. Qian
  • Mobile:13162771109
  • Address:No.1 Zhancheng Road, Fuhai Street, Bao'an District, Shenzhen

INTRODUCTION

2026 Shenzhen International photoresist industry technology exhibition - www.globalomp.com

2026 Shenzhen International photoresist industry technology exhibition - www.globalomp.com

2026 Shenzhen International photoresist industry technology exhibition

PCB photoresist exhibition, LCD photoresist exhibition, semiconductor photoresist exhibition

Date: June 10-12, 2026

Location: Shenzhen International Convention and Exhibition Center


Exhibition Background

Photoresist is a key material for micro pattern processing in the electronic field, known as the pearl on the crown of semiconductor materials, and plays an important role in the production of semiconductors, new displays, printed circuit boards, and other pan semiconductor fields. With the deepening global dependence on semiconductor technology, the importance of photoresist is becoming increasingly prominent. At present, the development of China's photolithography industry is facing many challenges. In the field of photoresist, the self-sufficiency rate of high-end photoresist in China is low, and there is a gap between the research and development and production technology and the international advanced level. The product performance and quality are difficult to meet the needs of high-end chip manufacturing. In terms of wet electronic chemicals, some high-purity and specially formulated products rely on imports, which limits their supply. The high-precision manufacturing technology of mask templates is difficult, and high-end mask template raw materials mainly rely on imports, with supply controlled by others. Its rapid repair and updating technology needs to be improved. Photolithography machines are even more monopolized by foreign countries, and high-end lithography machines such as EUV lithography machines are difficult to obtain. Domestic lithography machine enterprises have a significant gap with the international advanced level in terms of technological level, manufacturing accuracy, light source system, etc., which has become a bottleneck restricting the development of China's semiconductor industry.

To promote innovation in high-end photoresist technology in China, accelerate breakthroughs in core technologies and industrial applications, while strengthening collaborative research and technology exchanges between downstream demand applications, scientific research, and industrial enterprises. The 2026 Shenzhen International Photoresist Industry Technology Exhibition will focus on showcasing high-performance photoresists in the fields of integrated circuits, new displays, and PCBs, as well as raw material technologies and equipment such as photoresist specific resins, photoinitiators, pigments, etc., and promoting technology exchanges between industry, academia, and research. It is the most important industry event in the field of photoresist in China, held once a year. The conference has become an important platform to promote innovation in high-end photoresist technology in China, accelerate breakthroughs in core technologies and industrial applications, and strengthen the deep integration of industry, academia, research and application. It has had a wide impact in the industry.

█ Schedule:

Registration and Exhibition: June 8-9, 2026 Exhibition Time: June 10-12, 2026


Top level event (sponsored and co organized by the organizers, please call the organizing committee for details)

Brand Display High Level Forum Industry User Negotiation Conference Foreign Procurement Conference New Technology and Product Launch Conference

Building an international procurement and trade platform, promoting enterprise exchanges and cooperation, and improving exhibition effectiveness

————This will be our goal!

Collect the latest sales information and meet high-quality buyers from both domestic and international markets;

Understand future product demands and obtain the latest market development information;

Seeking new business opportunities through industry division of labor cooperation and industry chain demand;

An excellent platform for releasing new technologies and showcasing new products, gaining opportunities for market promotion and brand building, and increasing industry awareness;

Participate in relevant forum activities to learn about the latest industry trends and technological innovations.


Exhibition advantages:

Launching Annual New Products - Over a hundred media outlets are competing to broadcast and report on it, which is an important channel for enterprises to release annual new products

Understand industry trends - as a "barometer" and "barometer" of the industry, display market trends and tendencies in a timely manner

Maintaining important customers - this is a grand event that industry insiders will not miss, and it is also a good opportunity for you to meet and maintain old customers and receive new customers


Scope

Scope of exhibits:

PCB photoresist, LCD photoresist, and semiconductor photoresist. PCB (dry film photoresist, wet film photoresist, and photo imaging solder mask ink); LCD (color photoresist, black photoresist, touch screen photoresist, and TFT-LCD photoresist); Semiconductors (UV photoresist, deep UV photoresist, extreme UV photoresist, electron beam photoresist, ion beam photoresist, and X-ray photoresist), etc;

Lithography materials: SOC, BARC/SiARC, photoresist TARC、Top Coating、 Diluents, rinsing solutions, developing solutions, etc;

Lithographic collagen materials (photoinitiators/sensitizers, resins, monomers, solvents, additives), etc;

Special reagents for photoresist: diluents/edge removers, film-forming agents, photosensitizers, solvents and additives, developing solutions and stripping solutions, etc;

Lithography technology, photoresist and wet electronic chemicals, nanoimprinting, specialty gases, masks and lithography materials and equipment, etc;

Equipment: synthesis, purification, mixing, filtration, lithography machine, coating and development equipment, as well as subsequent etching, measurement and other equipment;


Costs & Precautions

Please contact the exhibition organizer before participating in the exhibition to confirm.

2026 Shenzhen International photoresist industry technology exhibition - www.globalomp.com

2026 Shenzhen International photoresist industry technology exhibition - www.globalomp.com


Contact

  • Telephone:13162771109
  • Contact:Mr. Qian
  • Mobile:13162771109
  • Address:No.1 Zhancheng Road, Fuhai Street, Bao'an District, Shenzhen

Disclaimer

The information on this site comes from the network and related members, and the website has done its duty to review it. Due to the uncontrollability of the process of organizing the exhibition, some of the exhibition information in the station may change the subject matter, Extending or cancelling the event, please exhibitors and visitors must check with each other again before exhibiting! All the exhibitions in this site are not hosted/co-organized or organized, if there are any disputes during the exhibition, please hold the main responsibility of the exhibition organization! QQ Email: 523138820@qq.com WeChat: 523138820 Mobile: 15313206870

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