2026 Shenzhen International Photolithography Equipment and Photomask Exhibition

Date: April 9-11, 2026

Location: Shenzhen Convention and Exhibition Center (Futian)

Exhibition Background

The development of microelectronics technology has always been the driving force behind the transformation of lithography equipment and technology, and lithography technology will continue to be at the forefront of many technologies in the 21st century. Since its inception, photolithography technology has been widely used as a pattern transfer technique in the semiconductor manufacturing industry. With the continuous improvement of chip integration, the continuous reduction of device size, and the continuous improvement of device functionality, the most critical lithography technology and lithography process equipment in semiconductor processing technology will inevitably undergo significant changes.

With the development of the integrated circuit industry, the integration degree of high-end chips has reached thousands or even billions of transistors, promoting the development of chip packaging technology towards higher density and higher performance. In the situation where traditional proximity/contact lithography machines are increasingly unable to meet the development needs of advanced packaging processes with high performance, high density, and low cost, advanced large field of view, large depth of focus, and high-precision projection lithography machines have gradually become key equipment for advanced packaging production lines. Shanghai Xuntong Exhibition Co., Ltd., in collaboration with numerous associations, is hosting the "2026 Shenzhen International Lithography Equipment and Photomask Application Technology Exhibition and Development Forum" at the Shenzhen Convention and Exhibition Center. Relevant units are welcome to participate and visit!

Schedule:

Report Exhibition: April 07-08, 2026 Opening Ceremony: April 09, 2026 09:30

Display transaction: April 9-11, 2026 Withdrawal: April 11, 2026 15:00

Top level event (sponsored and co organized by the conference, please call the organizing committee for details)

Brand display, high-level forum, industry user negotiation meeting, foreign procurement meeting, new technology and product launch conference - will be our goal!

Unprecedented scale - exhibition area of 35000 square meters, 800 international standard booths, and over 50000 professional visitors

Infinite business opportunities - With a gathering of buyers, the huge business opportunities in the lithography equipment and mask technology industry are fully demonstrated, and the global market potential of the lithography equipment and mask technology industry is shared and accessed

◆ Technology Gathering - Gathering of the latest products and achievements at home and abroad, exhibitions, forums, and economic and trade cooperation, is an efficient platform for enterprise promotion and market development

◆ Project Gathering - Annual industry meetings, trade negotiations, and designated procurement by international trade companies are important platforms for exhibition and investment attraction

Scope of exhibits:

Exposure light source, optical system, electrical system, mechanical system, and control system, etc;

Lithography machine, lithography technology, step projection lithography machine, scanning projection lithography machine, nanolithography technology, maskless lithography technology, immersive lithography technology, excimer laser lithography technology, extreme ultraviolet lithography machine, electron beam lithography, ion beam lithography, X-ray lithography, STM lithography, nanoimprint lithography technology, micro lithography technology, electron beam exposure machine, ion beam exposure, 3D printing, etching machine, lithography machine components, lithography pre-treatment materials, exposure system, lithography mask inorganic chip and processing system, light source and photoresist, photoresist collagen material, photoresist coating and processing equipment, etc;

◆ Photomask, chrome plate, dry plate, relief plate, liquid relief plate, film, binary photomask and phase-shifting photomask, photomask graphic drawing equipment, photomask testing, etc;

Audience Range:

The exhibition will invite relevant research institutions from all over the country, including electronics, microelectronics, optoelectronics, integrated circuits, semiconductors, micro/nano motor systems, chip manufacturing, biological devices, nanotechnology, flat panel displays, IC manufacturing, photovoltaics, aerospace, national defense and military industries IC、TP、LED、LCD、 Representatives from manufacturing industries such as discrete devices, solar energy, printing, and imaging, as well as experts from universities, research institutes, consulting firms, and public institutions, will attend the conference for visits and negotiations.

It is expected that the exhibition will attract decision-makers and professionals from countries and regions such as China, Japan, Europe, North America, South Korea, Taiwan, etc. Exhibitors from various countries can meet face-to-face with highly potential application customer groups and partners at the exhibition. Exhibitors will further develop their markets in China and Asia through the exhibition of lithography equipment and photomask technology.

New technology launch event, new product promotion event, and specialized seminar

The organizer plans to hold a series of new product and technology press conferences, new product promotion events, and product themed seminars during the exhibition period. Exhibitors can receive priority sponsorship rights for the seminars, and relevant companies can independently determine the content of the reports and provide relevant documents. Each sponsoring company can decide on the number of visitors to be invited.

Each session costs 30000 RMB and lasts for 25 minutes (including various supporting facilities and promotional expenses)

Exhibition matters

1. Exhibitors shall fill in the "Exhibition Contract Form" in detail and affix their official seal, and mail or fax it to the organizing committee;

2. The organizing committee has received the confirmation application form. Exhibitors must transfer 50% or the full amount of the exhibition fee to the organizing committee's account within 3 working days, and fax the remittance voucher to the organizing committee for verification. Otherwise, the reserved booth will not be retained.

3. The booth arrangement is based on the principle of "first come, first paid, first arranged", and the organizing committee has the right to adjust a small number of booths;

4. The transportation of exhibits, exhibition reception, accommodation and other matters will be separately sent by the organizing committee in the form of an "Exhibitor Handbook" one month before the event.

Organizing Committee of the 2026 Shenzhen International Lithography Equipment and Photomask Application Technology Exhibition

Shanghai Xuntong Exhibition Co., Ltd

Consultation hotline: 021-5415 5272

Contact: Liang Jiajin 137 9531 5366

• Telephone:137 9531 5366
• Truename:Liang Jiajin
• Mobile:137 9531 5366
• Address:Intersection of Fuhua 3rd Road and Jintian Road, Futian District, Shenzhen, Guangdong Province

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